Thomas Schicketanz
26Patents
3h-index
44Co-inventors
59Inventor score
Filing activity: Sep 18, 2009 → Apr 14, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10545323B2 | Projection optical unit for EUV projection lithography | Physics | 11 | Active |
| US8896814B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 5 | Active |
| US10120176B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 3 | Active |
| US9274327B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 3 | Active |
| US9459435B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 2 | Active |
| US10001631B2 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Emerging Cross-Sectional Technologies | 2 | Active |
| US8902406B2 | Projection objective | Physics | 1 | Active |
| US8446665B2 | Catadioptric projection objective | Physics | 1 | Active |
| US10474036B2 | Optical element and optical arrangement therewith | Physics | 1 | Active |
| US10203435B2 | EUV mirror and optical system comprising EUV mirror | Physics | 1 | Active |
| US9341756B2 | Method for correcting the surface form of a mirror | Physics | 0 | Active |
| US11927500B2 | Method and device for characterizing the surface shape of an optical element | Physics | 0 | Active |
| US9581910B2 | Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US8345222B2 | High transmission, high aperture catadioptric projection objective and projection exposure apparatus | Physics | 0 | Active |
| US9726870B2 | Catadioptric projection objective | Physics | 0 | Active |
| US9291751B2 | Imaging optical unit and projection exposure apparatus for projection lithography comprising such an imaging optical unit | Physics | 0 | Active |
| US9817220B2 | Catadioptric projection objective comprising deflection mirrors and projection exposure method | Physics | 0 | Active |
| US10520827B2 | Optical system, in particular for a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US11326872B2 | Method and device for characterizing the surface shape of an optical element | Physics | 0 | Active |
| US9639005B2 | Imaging catoptric EUV projection optical unit | Physics | 0 | Active |
| US8693098B2 | Projection objective for a microlithographic EUV projection exposure apparatus | Physics | 0 | Active |
| US9279969B2 | Catadioptric projection objective | Physics | 0 | Active |
| US9915873B2 | Reflective optical element, and optical system of a microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10042146B2 | Catadioptric projection objective | Physics | 0 | Active |
| US8873137B2 | Catadioptric projection objective | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.