Methods and apparatus to prevent interference between processing chambers

US11335577B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Fuhong Zhang · San Jose, US
• Sunil Kumar Garg · Sunnyvale, US
• Paul Kiely · Leixlip, IE
• Martin Lee Riker · Round Rock, US
• William Fruchterman · Santa Clara, US
• Zheng Wang · Beijing, CN
• Xiaodong Wang · Zhejiang, CN

Key dates

• Filing date: Oct 3, 2019
• Grant date: May 17, 2022
• Expiry date: Feb 17, 2040

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P90/02
• WIPO field: Control
• WIPO sector: Instruments

Abstract

Methods and apparatus to minimize electromagnetic interference between adjacent process chambers of a cluster tool are described. The start time of the subject recipe is controlled based on the electromagnetic process window of the subject process chamber, the electromagnetic window of the first adjacent process chamber and of an optional second adjacent process chamber. The start time of the subject process chamber is controlled to prevent temporal overlap of the electromagnetic window of the subject chamber with the electromagnetic window of an adjacent chamber.