Substrate transfer apparatus and method of measuring positional deviation of substrate
US11335578B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 13, 2020 |
| Grant date | May 17, 2022 |
| Priority date | — |
| Expiry date | Aug 2, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67748
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A substrate transfer apparatus of the present invention includes: a robot including a hand configured to hold a substrate, and an arm configured to move the hand; a robot control device configured to set a moving path for the hand and control the arm such that the hand moves on the moving path toward a target position; and a camera disposed so as to be able to capture an image of the substrate held by the hand located at a predetermined confirmation position. The robot control device sets the moving path so as to pass through the confirmation position, obtains an image captured by the camera when the hand is located at the confirmation position, calculates a distance between a predetermined environment and the substrate which are taken in the image, and calculates a positional deviation amount from a reference position of the substrate on the basis of the distance.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.