Patent · US Active

Liner assemblies for substrate processing systems

US11345996B2 · kind B2 · utility

2Cited by
11References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 28, 2018
Grant dateMay 31, 2022
Priority date
Expiry dateJan 8, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32477
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.