Washing method, washing device, storage medium, and washing composition
US11355362B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 2, 2018 |
| Grant date | Jun 7, 2022 |
| Priority date | — |
| Expiry date | Apr 5, 2038 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/22
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.