Patent · US Active

Advanced lithography and self-assembled devices

US11373950B2 · kind B2 · utility

0Cited by

13References

19Claims

0Family size

Assignee

Intel Corporation · US

Inventors

Richard E. Schenker · Portland, US
Robert L. Bristol · Portland, US
Kevin Lin · Beaverton, US
Florian Gstrein · Portland, US
James M. Blackwell · Portland, US
Marie Krysak · Portland, US
Manish Chandhok · Beaverton, US
Paul A. Nyhus · Portland, US
Charles H. Wallace · Portland, US
Curtis W. Ward · Hillsboro, US
Swaminathan Sivakumar · Portland, US
Elliot N. Tan · Portland, US

Key dates

Filing date	Dec 2, 2020
Grant date	Jun 28, 2022
Priority date	—
Expiry date	Dec 22, 2040

Classification

Technology area (CPC H)Electricity
CPC primaryH10D84/8311
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Advanced lithography techniques including sub-10 nm pitch patterning and structures resulting therefrom are described. Self-assembled devices and their methods of fabrication are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.