Memory cell arrangement and method thereof
US11380695B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 30, 2020 |
| Grant date | Jul 5, 2022 |
| Priority date | — |
| Expiry date | Jan 29, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D1/716
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A memory cell arrangement is provided that may include: one or more memory cells, each of the one or more memory cells including: an electrode pillar having a bottom surface and a top surface; a memory material portion surrounding a lateral surface portion of the electrode pillar; an electrode layer surrounding the memory material portion and the lateral surface portion of the electrode pillar, wherein the electrode pillar, the memory material portion, and the electrode layer form a capacitive memory structure; and a field-effect transistor structure comprising a gate structure, wherein the bottom surface of the electrode pillar faces the gate structure and is electrically conductively connected to the gate structure, and wherein the top surface of the electrode pillar faces away from the gate structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.