Apparatus and method for determining a position of an element on a photolithographic mask
US11385540B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2020 |
| Grant date | Jul 12, 2022 |
| Priority date | — |
| Expiry date | Jan 9, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2826
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present application relates to an apparatus for determining a position of at least one element on a photolithographic mask, said apparatus comprising: (a) at least one scanning particle microscope comprising a first reference object, wherein the first reference object is disposed on the scanning particle microscope in such a way that the scanning particle microscope can be used to determine a relative position of the at least one element on the photolithographic mask relative to the first reference object; and (b) at least one distance measuring device, which is embodied to determine a distance between the first reference object and a second reference object, wherein there is a relationship between the second reference object and the photolithographic mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.