Patent · US Active

Method for controlling a processing system

US11396699B2 · kind B2 · utility

1Cited by
0References
8Claims
0Family size

Assignee

Inventor

Key dates

Filing dateAug 19, 2019
Grant dateJul 26, 2022
Priority date
Expiry dateAug 19, 2039

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/54
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Embodiments described herein generally relate to methods for controlling a processing system. Particularly, subfab components of the processing system may be controlled based on the flow of materials into the processing system. In some embodiments, the flow of an inert gas used to dilute the effluent gases may be controlled in accordance with the flow of one or more precursor gases. Thus, the cost of running the processing system is reduced while mitigating critical EHS concerns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.