Plasma processing apparatus and plasma processing method
US11398372B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 5, 2015 |
| Grant date | Jul 26, 2022 |
| Priority date | — |
| Expiry date | Oct 30, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/681
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus that performs plasma processing to a substrate held on a transport carrier including a frame and a holding sheet that covers an opening of the frame includes: a transport mechanism that transports the transport carrier; a position measuring section that measures a position of the substrate to the frame; a plasma processing section that includes a plasma processing stage on which the transport carrier is loaded and a cover that covers the frame and a part of the holding sheet loaded on the plasma processing stage, and has a window section for exposing a part of the substrate; and a control section that controls the transport mechanism such that the transport carrier is loaded on the plasma processing stage to satisfy a positional relationship between the window section and the substrate based on the position information of the substrate to the frame.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.