Inventor · Osaka, JP

Mitsuru Hiroshima

18Patents
2h-index
17Co-inventors
47Inventor score

Filing activity: Mar 19, 2008 → Jun 14, 2017

Most-cited inventions

PatentTitleAreaCited byStatus
US8673166B2 Plasma processing apparatus and plasma processing method Emerging Cross-Sectional Technologies 13 Active
US8906249B2 Plasma processing apparatus and plasma processing method Electricity 5 Active
US9431263B2 Plasma processing method and apparatus Chemistry; Metallurgy 2 Active
US9653334B2 Plasma processing apparatus and method Electricity 2 Active
US9583355B2 Plasma processing apparatus and plasma processing method Electricity 2 Active
US9911677B2 Element chip and method for manufacturing the same Electricity 1 Active
US9779986B2 Plasma treatment method and method of manufacturing electronic component Electricity 1 Active
US9922899B2 Method of manufacturing element chip and element chip Electricity 1 Active
US10475704B2 Method of manufacturing element chip and element chip Electricity 0 Active
US9905452B2 Method of forming mask pattern, method of processing substrate, and method of fabricating element chips Electricity 0 Active
US9941167B2 Method for manufacturing element chip Electricity 0 Active
US8563332B2 Wafer reclamation method and wafer reclamation apparatus Electricity 0 Active
US10177063B2 Element chip and method for manufacturing the same Electricity 0 Active
US10497622B2 Element chip manufacturing method Electricity 0 Active
US10049933B2 Element chip manufacturing method Electricity 0 Active
US10236266B2 Element chip manufacturing method Electricity 0 Active
US11398372B2 Plasma processing apparatus and plasma processing method Electricity 0 Active
US9698073B2 Method of manufacturing element chip and element chip Electricity 0 Active

Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.