Si-containing film forming compositions and methods of making and using the same

US11407922B2 · kind B2 · utility

Assignees

• L'Air Liquide, Societe Anonyme Pour l'Etude et l'Exploitation des Procedes Georges Claude · FR
• American Air Liquide, Inc. · US

Inventors

• Manish Khandelwal · Danbury, US
• Sean Kerrigan · Champaign, US
• Jean-Marc Girard · Versailles, FR
• Antonio Sanchez · Tsukuba, JP
• Peng Zhang · Montvale, US
• Yang Wang · Shanghai, CN

Key dates

• Filing date: Mar 23, 2017
• Grant date: Aug 9, 2022
• Expiry date: Jul 9, 2037

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08G77/70
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Si-containing film forming compositions are disclosed comprising a precursor having the formula [—NR—R4R5Si—(CH2)t—SiR2R3—]n wherein n=2 to 400; R, R2, R3, R4, and R5 are independently H, a hydrocarbon group, or an alkylamino group, and provided that at least one of R2, R3, R4, and R5 is H; and R is independently H, a hydrocarbon group, or a silyl group. Exemplary pre-cursors include, but are not limited to, [—NH—SiH2—CH2—SiH2—]n, and [—N(SiH2—CH2—SiH3)—SiH2—CH2—SiH2—]n.