Patent · US Active

Advanced electrodeposited copper foil having island-shaped microstructures and copper clad laminate using the same

US11408087B2 · kind B2 · utility

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1References
18Claims
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Key dates

Filing dateJun 19, 2020
Grant dateAug 9, 2022
Priority date
Expiry dateNov 12, 2040

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/12431
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An advanced electrodeposited copper foil having island-shaped microstructures and a copper clad laminate using the same are provided. The advanced electrodeposited copper foil includes a micro-roughened surface. The micro-roughened surface has a plurality of copper crystals, a plurality of copper whiskers and a plurality of copper crystal groups which are in a non-uniform distribution and form into island-shaped patterns.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.