Imprint apparatus, operation method of imprint apparatus, and article manufacturing method
US11413651B2 · kind B2 · utility
0Cited by
6References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 15, 2017 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Jan 22, 2038 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7042
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An imprint apparatus performs an imprint process of forming a pattern on a substrate by bringing a mold into contact with an imprint material on the substrate and curing the imprint material. The apparatus includes a substrate stage mechanism having a substrate chuck configured to hold the substrate, a mold driver configured to drive the mold, and a controller configured to control, based on tilt information indicating a tilt of the substrate chuck which is caused by a force received from the mold driver, the mold driver so as to adjust a relative tilt of the mold with respect to the substrate in the imprint process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.