Patent · US Active

Method for functionalising a substrate

US11415881B2 · kind B2 · utility

0Cited by

1References

12Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Stefan Landis · Tullins, FR
Raluca Tiron · Saint-Égrève, FR

Key dates

Filing date	Dec 7, 2017
Grant date	Aug 16, 2022
Priority date	—
Expiry date	Dec 13, 2038

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0002
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for functionalising a substrate intended for the self-assembly of a block copolymer, includes depositing on the surface of a substrate a layer of a first polymer material, the first polymer having a first chemical affinity with respect to the block copolymer; grafting one part only of the first polymer material layer onto the surface of the substrate; printing, using a mould, patterns in a sacrificial layer arranged above the grafted part of the first polymer material layer; transferring the patterns of the sacrificial layer into the grafted part of the first polymer material layer, until the substrate is reached; and removing at least one part of the sacrificial layer by wet etching, so as to uncover the grafted part of the first polymer material layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.