Raluca Tiron
19Patents
2h-index
30Co-inventors
50Inventor score
Filing activity: Dec 16, 2008 → Aug 16, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9527108B2 | Method for preparing surfaces | Chemistry; Metallurgy | 2 | Active |
| US10347721B2 | Method to increase strain in a semiconductor region for forming a channel of the transistor | Electricity | 2 | Active |
| US8152364B2 | Method for measuring the creep of a thin film inserted between two rigid substrates, with one cantilever end | Physics | 2 | Active |
| US10741757B2 | Process for the manufacture of a recurrent neural network calculator | Electricity | 1 | Active |
| US10795257B2 | Method for forming a functionalised guide pattern for a graphoepitaxy method | Electricity | 1 | Active |
| US9535329B2 | Grapho-epitaxy method for making patterns on the surface of a substrate | Electricity | 1 | Active |
| US10923352B2 | Method for forming a functionalised guide pattern for a graphoepitaxy method | Electricity | 1 | Active |
| US11489012B2 | Method of producing a recurrent neural network computer | Electricity | 0 | Active |
| US11415881B2 | Method for functionalising a substrate | Physics | 0 | Active |
| US10784108B2 | Method for forming a functionalised assembly guide | Performing Operations; Transporting | 0 | Active |
| US9599890B2 | Method for manufacturing a nanolithography mask | Electricity | 0 | Active |
| US10978594B2 | Transistor comprising a channel placed under shear strain and fabrication process | Electricity | 0 | Active |
| US9147750B2 | Process for fabricating a transistor comprising nanoscale semiconductor features using block copolymers | Electricity | 0 | Active |
| US10928725B2 | Method for the directed self-assembly of a block copolymer by graphoepitaxy | Electricity | 0 | Active |
| US10845705B2 | Method for forming a chemical guiding structure on a substrate and chemoepitaxy method | Performing Operations; Transporting | 0 | Active |
| US11688811B2 | Transistor comprising a channel placed under shear strain and fabrication process | Electricity | 0 | Active |
| US11817490B2 | Method for making a quantum device with nuclear spin qubits | Electricity | 0 | Active |
| US12022751B2 | Method for fabricating molds for lithography by nano-imprinting | Electricity | 0 | Active |
| US9566610B2 | Method for making patterns on the surface of a substrate using block copolymers | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.