Resist composition and patterning process
US11415887B2 · kind B2 · utility
5Cited by
1References
13Claims
0Family size
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Key dates
| Filing date | Feb 11, 2020 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Jan 17, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition comprising a base polymer and a quencher in the form of a salt of a cyclic ammonium cation with a carboxylate, sulfonamide, halogenated phenoxide or halide anion offers a high sensitivity and minimal LWR or improved CDU, independent of whether it is of positive or negative tone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.