Extreme ultraviolet light source system
US11415891B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2021 |
| Grant date | Aug 16, 2022 |
| Priority date | — |
| Expiry date | Apr 2, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light source system includes a chamber configured to maintain a pressure of an inner space thereof at a first pressure, a droplet supply unit disposed in the chamber and configured to discharge a droplet on a first path, a light source configured to emit a light for generating plasma by irradiating a laser light to the droplet at a focal point on the first path, and a suction unit disposed on the first path so as to face the droplet supply unit in the chamber and configured to suction debris of the droplet irradiated with the laser light at a second pressure, lower than the first pressure, wherein the suction unit includes a nozzle protruding from a side wall of the chamber toward the focal point, and an end of the nozzle is closer to the focal point than it is to the side wall of the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.