Patent · US Active

Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus

US11415892B2 · kind B2 · utility

2Cited by

8References

9Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Matthias KAES · Aalen, DE
Steffen Bezold · Nuremberg, DE
Matthias Manger · Neukochen, DE
Christoph Petri · Oberkochen, DE
Pavel Alexeev · Aalen, DE
Walter Pauls · Wertingen, DE

Key dates

Filing date	Jan 12, 2021
Grant date	Aug 16, 2022
Priority date	—
Expiry date	Jan 12, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG02B1/14
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.