Patent · US Active

Projection exposure system for semiconductor lithography having an optical arrangement

US11415894B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Judith Fingerhuth · Aalen, DE
Norbert Wabra · Werneck, DE
Sonja Schneider · Lehrberg, DE
Ferdinand Djuric-Rissner · Aalen, DE
Peter Graf · Orinda, US
Reimar Finken · Faulenmühle, DE

Key dates

Filing date	Jul 20, 2021
Grant date	Aug 16, 2022
Priority date	—
Expiry date	Jul 20, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70258
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure apparatus for semiconductor technology includes an optical arrangement with an optical element having an optically effective surface. The optical arrangement also includes an actuator embedded in the optical element. The actuator is outside the optically effective surface and outside the region located behind the optically effective surface. The optical arrangement is set up to deform the optically effective surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.