Sonja Schneider
22Patents
3h-index
46Co-inventors
59Inventor score
Filing activity: Feb 2, 2010 → Apr 5, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US9939730B2 | Optical assembly | Physics | 4 | Active |
| US9134613B2 | Illumination and displacement device for a projection exposure apparatus | Physics | 3 | Active |
| US10048592B2 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Physics | 3 | Active |
| US11489590B1 | Optical link and coherent receiver noise characterization | Electricity | 2 | Active |
| US9910364B2 | Projection exposure apparatus including at least one mirror | Physics | 2 | Active |
| US10018907B2 | Method of operating a microlithographic projection apparatus | Physics | 2 | Active |
| US10401540B2 | Optical element having a coating for influencing heating radiation and optical arrangement | Physics | 2 | Active |
| US10001631B2 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Emerging Cross-Sectional Technologies | 2 | Active |
| US8228483B2 | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate | Emerging Cross-Sectional Technologies | 1 | Active |
| US9470872B2 | Reflective optical element | Physics | 1 | Active |
| US11415894B2 | Projection exposure system for semiconductor lithography having an optical arrangement | Physics | 1 | Active |
| US11112543B2 | Optical element having a coating for influencing heating radiation and optical arrangement | Physics | 1 | Active |
| US9372411B2 | Projection objective of a microlithographic projection exposure apparatus | Electricity | 1 | Active |
| US9348234B2 | Microlithographic apparatus | Physics | 1 | Active |
| US9817316B2 | Projection exposure method and projection exposure apparatus for microlithography | Physics | 1 | Active |
| US12115841B2 | Ground milling machine | Fixed Constructions | 0 | Active |
| US9829800B2 | System correction from long timescales | Physics | 0 | Active |
| US10591825B2 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Physics | 0 | Active |
| US9709770B2 | Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus | Physics | 0 | Active |
| US12025818B2 | Optical element having a coating for influencing heating radiation and optical arrangement | Physics | 0 | Active |
| US10754132B2 | Imaging optical system for microlithography | Physics | 0 | Active |
| US10061206B2 | Projection lens with wave front manipulator and related method and apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.