Method of achieving improved transient response in apparatus for controlling flow and system for accomplishing same
US11424148B2 · kind B2 · utility
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193References
19Claims
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Key dates
| Filing date | Apr 30, 2020 |
| Grant date | Aug 23, 2022 |
| Priority date | — |
| Expiry date | Oct 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67017
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. In one embodiment, a gas flow control system for achieving improved transient response in apparatuses for controlling gas flow is disclosed. Specifically, by providing a command to an apparatus to deliver a predetermined mass flow rate at a future turn on time, the apparatus is able to pre-pressurize a P1 volume so that the response time of the apparatus is no longer dependent on the speed of the apparatus's control valves and the limitations of the control loop.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.