Semiconductor layer stack and method for producing same
US11424596B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Dec 28, 2020 |
| Grant date | Aug 23, 2022 |
| Priority date | — |
| Expiry date | Feb 17, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/3054
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A semiconductor layer stack, a component made therefrom, a component module, and a production method is provided. The semiconductor layer stack has at least two layers (A, B), which, as individual layers, each have an energy position of the Fermi level in the semiconductor band gap, applying to the layer (A) and applying to the layer (B), with EF the energy position of the Fermi level, EV the energy position of the valence band, EL the energy position of a conduction band and EL−EV the energy difference of the semiconductor band gap EG, the thickness of the layers (A, B) being selected in such a way that a continuous space charge zone region over the layers (A, B) results.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.