Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same
US11435667B2 · kind B2 · utility
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10Claims
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Key dates
| Filing date | Jul 4, 2018 |
| Grant date | Sep 6, 2022 |
| Priority date | — |
| Expiry date | Oct 6, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G73/0655
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Provided are a polymer for an organic bottom anti-reflective coating and a bottom anti-reflective coating composition containing the same. More specifically, provided are a polymer for an organic bottom anti-reflective coating capable of relieving reflection of exposure light and irradiation light on a substrate of a photoresist layer applied on the substrate in a lithographic process of manufacturing a semiconductor device, and a bottom anti-reflective coating composition containing the same.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.