Jinsu Ham
2Patents
0h-index
11Co-inventors
25Inventor score
Filing activity: Jul 2, 2018 → Jul 4, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US11725076B2 | Polymer for formation of resist underlayer film, composition for formation of resist underlayer film comprising same and method for manufacturing semiconductor element by using same | Chemistry; Metallurgy | 0 | Active |
| US11435667B2 | Polymer for organic bottom anti-reflective coating and bottom anti-reflective coatings comprising the same | Chemistry; Metallurgy | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.