Lithography apparatus and method for using the same
US11437161B1 · kind B1 · utility
1Cited by
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20Claims
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Key dates
| Filing date | Apr 28, 2021 |
| Grant date | Sep 6, 2022 |
| Priority date | — |
| Expiry date | Apr 28, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0025
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An apparatus includes an extreme ultraviolet light source vessel having an intermediate focus, a scanner having a light source aperture, and a deflection module arranged between the intermediate focus and the light source aperture. The deflection module includes a first electrode plate and a second electrode plate, configured to create an electric field therebetween. Tin particles moving from the intermediate focus to the light source aperture passes through the deflection module, and are deflected by the electric field therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.