Patent · US Active

Vapor chamber, heatsink device, and electronic device

US11445636B2 · kind B2 · utility

3Cited by
3References
19Claims
0Family size

Assignees

Inventors

Key dates

Filing dateOct 31, 2019
Grant dateSep 13, 2022
Priority date
Expiry dateOct 19, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L23/427
  • WIPO fieldThermal processes and apparatus
  • WIPO sectorMechanical engineering

Abstract

A vapor chamber that includes a housing including a first sheet and a second sheet opposing each other and joined together at outer edges of the first sheet and the second sheet and defining a hollow vapor flow pass therein; a working fluid in the housing; a first wick in contact with the vapor flow pass; and a second wick between the first wick and an inner wall surface of at least one of the first sheet and the second sheet. The first wick defines a first liquid flow pass, the second wick defines a second liquid flow pass, and a first average diameter of the first liquid flow pass is smaller than or equal to 75% of a second average diameter of the second liquid flow pass.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.