Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same
US11447859B2 · kind B2 · utility
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15Claims
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Key dates
| Filing date | Apr 26, 2018 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Aug 3, 2040 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/50
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Provided are a novel metal triamine compound, a method for preparing the same, a composition for depositing a metal-containing thin film including the same, and a method for preparing a metal-containing thin film using the same. The metal triamine compound of the present invention has excellent reactivity, is thermally stable, has high volatility, and has high storage stability, and thus, it may be used as a metal-containing precursor to easily prepare a high-purity metal-containing thin film having high density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.