Layer forming method and apparatus
US11447864B2 · kind B2 · utility
1Cited by
2,211References
20Claims
0Family size
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Key dates
| Filing date | Apr 6, 2020 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Aug 3, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76877
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is provided a method and apparatus to deposit a molybdenum comprising layer on a substrate by supplying a precursor comprising molybdenum(VI) dichloride dioxide and a first reactant comprising boron and hydrogen to the substrate in a reaction chamber to react and form the molybdenum layer. The first reactant comprising boron and hydrogen may be diborane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.