Patent · US Active

Beam-forming and illuminating system for a lithography system, lithography system, and method

US11448968B2 · kind B2 · utility

0Cited by

0References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Hubert Holderer · Oberkochen, DE
Klaus Abele · Trochtelfingen, DE
Björn Liebaug · Ulm, DE

Key dates

Filing date	Sep 14, 2020
Grant date	Sep 20, 2022
Priority date	—
Expiry date	Sep 14, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A beam-forming and illuminating system for a lithography system, such an EUV lithography system, includes an optical element and an adjusting device. The adjusting device is configured so that, during a heat-up phase of the beam-forming and illuminating system, the adjusting device measures a field position and/or a pupil position of the beam-forming and illuminating system and adjusts the orientation and/or position of the optical element based on the measured field position and/or pupil position to keep the optical element in a desired position.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.