Measuring a pattern
US11449979B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2020 |
| Grant date | Sep 20, 2022 |
| Priority date | — |
| Expiry date | Apr 28, 2041 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
There is provided a method, a non-transitory computer readable medium, and a system for measuring a pattern. The method can include (a) obtaining an electron image of an area of a sample, the area comprises the pattern, the electron image comprises multiple lines; each line comprises information obtained by moving an electron beam over a scan line; (b) generating a converted image by applying a noise reduction kernel on the electron image, the noise reduction kernel has a width that represents a number of consecutive lines of the electron image; the width is determined based on relationships between analysis results obtained when using noise reduction kernels of different widths; and (c) analyzing the converted image to provide a pattern measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.