Apparatus and method for measuring the surface temperature of a substrate
US11454543B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 3, 2018 |
| Grant date | Sep 27, 2022 |
| Priority date | — |
| Expiry date | Sep 14, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2005/0074
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for measuring surface temperature of a substrate being illuminated by a pulsed light beam configured to heat the substrate and by a beam of probing light, wherein the heated substrate emits a radiated beam of thermal radiation, wherein the apparatus includes an optical system configured to collect the radiated beam and a reflected beam of probing light propagating in substantially close directions, wherein the collected radiated beam and the collected reflected beam are separately routed to a respective detector via a respective routing element, the respective detectors being configured to measure the intensity of the collected radiated beam and collected reflected beam simultaneously and at the same wavelength, wherein the surface temperature is calculated based on the collected radiated beam and on the collected reflected beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.