Aberration reduction in multipass electron microscopy
US11456148B2 · kind B2 · utility
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Key dates
| Filing date | May 28, 2019 |
| Grant date | Sep 27, 2022 |
| Priority date | — |
| Expiry date | Sep 15, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2617
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Improved aberration correction in multipass electron microscopy is provided by having Fourier images of the sample (instead of real images) at the reflection planes of the resonator. The resulting −1 magnification of the sample reimaging can be compensated by appropriate sample placement or by adding compensating elements to the resonator. This enables simultaneous correction of lowest order chromatic and spherical aberration from the electron objective lenses. If real images of the sample are at the reflection planes of the resonator instead, only the lowest order chromatic aberration can be corrected.
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