Patent · US Active

Drain-extended transistor

US11456381B2 · kind B2 · utility

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4References
20Claims
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Assignee

Inventors

Key dates

Filing dateDec 16, 2020
Grant dateSep 27, 2022
Priority date
Expiry dateDec 16, 2040

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D64/516

Abstract

Described examples include an integrated circuit having a semiconductor substrate. The integrated circuit has a transistor that includes a buried layer having within the substrate, the buried layer defining a drift region between the buried layer and the top surface and a body region in the substrate extending from the buried layer to the surface of the substrate. The transistor also having a source formed in the body region, a drain extending from the buried layer to the surface of the substrate, a drift well extending from the buried layer toward the top surface and extending from the body region to the drain, a drift surface layer located between the drift well and the top, and a gate proximate to the surface of the substrate at the body region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.