Ruthenium removal composition and method of producing magnetoresistive random access memory
US11456412B2 · kind B2 · utility
0Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 2020 |
| Grant date | Sep 27, 2022 |
| Priority date | — |
| Expiry date | Jun 2, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N50/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A treatment liquid contains orthoperiodic acid and water, and the pH is 11 or more. It is preferable that the content of orthoperiodic acid in the treatment liquid is 0.01% to 5% by mass with respect to the total mass of the treatment liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.