Electron beam column for three-dimensional printing device, three-dimensional printing device, and three-dimensional printing method
US11458561B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 12, 2017 |
| Grant date | Oct 4, 2022 |
| Priority date | — |
| Expiry date | Jan 24, 2038 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P10/25
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
To provide a three-dimensional printing device that irradiates approximately the same ranges on the surface of a powder layer simultaneously with a plurality of electron beams having different beam shapes. An electron beam column 200 of the three-dimensional printing device 100 includes a plurality of electron sources 20 including electron sources having anisotropically-shaped beam generating units, and beam shape deforming elements 30 that deform the beam shapes of electron beams output from the electron sources 20 on a surface 63 of a powder layer 62. A deflector 50 included in the electron beam column 200 deflects an electron beam output from each of the plurality of electron sources 20 by a distance larger than the beam space between electron beams before passing through the deflector 50.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.