Patent · US Active

Method for the qualification of a mask for microlithography

US11460785B2 · kind B2 · utility

0Cited by

0References

24Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventor

Dirk Hellweg · Langenau, DE

Key dates

Filing date	May 21, 2020
Grant date	Oct 4, 2022
Priority date	—
Expiry date	May 21, 2040

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70625
WIPO fieldOptics
WIPO sectorInstruments

Abstract

For the qualification of a mask for microlithography, the effect of an aerial image of the mask on the wafer is ascertained by means of a simulation for predicting the wafer structures producible by means of the mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.