Dirk Hellweg
16Patents
1h-index
36Co-inventors
50Inventor score
Filing activity: Mar 24, 2009 → Jun 27, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8325322B2 | Optical correction device | Physics | 11 | Active |
| US10761420B2 | Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method | Physics | 1 | Active |
| US8659745B2 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Physics | 1 | Active |
| US12422743B2 | Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method | Physics | 0 | Active |
| US11256178B2 | Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method | Physics | 0 | Active |
| US8542346B2 | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations | Physics | 0 | Active |
| US9915871B2 | Method for measuring an angularly resolved intensity distribution and projection exposure apparatus | Physics | 0 | Active |
| US9081294B2 | Method for measuring an angularly resolved intensity distribution and projection exposure apparatus | Physics | 0 | Active |
| US10775691B2 | Method for examining photolithographic masks and mask metrology apparatus for performing the method | Physics | 0 | Active |
| US10564551B2 | Method for determining a focus position of a lithography mask and metrology system for carrying out such a method | Physics | 0 | Active |
| US9785052B2 | Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors | Physics | 0 | Active |
| US12353141B2 | Method for heating an optical element in a microlithographic projection exposure apparatus and optical system | Physics | 0 | Active |
| US10481505B2 | Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks | Physics | 0 | Active |
| US11460785B2 | Method for the qualification of a mask for microlithography | Physics | 0 | Active |
| US11061331B2 | Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth | Physics | 0 | Active |
| US10948637B2 | Metrology system having an EUV optical unit | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.