Patent · US Active

Method for grinding silicon-containing solids

US11462734B2 · kind B2 · utility

0Cited by

4References

4Claims

0Family size

Assignee

Wacker Chemie AG · DE

Inventors

Eckhard Hanelt · Geltendorf, DE
Michael Fricke · Burghausen, DE

Key dates

Filing date	Nov 7, 2016
Grant date	Oct 4, 2022
Priority date	—
Expiry date	Jun 23, 2038

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E60/10
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to methods for producing silicon particles by grinding silicon-containing solids, wherein one or more gases are used, which contain reactive gas at a partial pressure of ≥0.3 bar, wherein reactive gases are selected from the group comprising oxygen, ozone, inorganic peroxides, carbon monoxide, carbon dioxide, ammonia, nitrogen oxides, hydrogen cyanide, hydrogen sulfide, sulfur dioxide, and volatile organic compounds.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.