System and method for determining type and size of defects on blank reticles
US11468553B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 17, 2019 |
| Grant date | Oct 11, 2022 |
| Priority date | — |
| Expiry date | Sep 17, 2039 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V2201/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system for characterizing a specimen is disclosed. In one embodiment, the system includes a controller configured to: receive training images of one or more defects of the specimen; generate a machine learning classifier based on the training images; receive product images of one or more defects of a specimen; determine one or more defect type classifications of one or more defects with the machine learning classifier; filter the product images with one or more smoothing filters; perform binarization processes to generate binarized product images; perform morphological image processing operations on the binarized product images; determine one or more algorithm-estimated defect sizes of the one or more defects based on the binarized product images; and determine one or more refined estimates of one or more defect sizes of the one or more defects based on the one or more algorithm-estimated defect sizes and the one or more defect type classifications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.