Vacuum plasma workpiece treatment apparatus
US11469085B2 · kind B2 · utility
0Cited by
7References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2017 |
| Grant date | Oct 11, 2022 |
| Priority date | — |
| Expiry date | Nov 22, 2038 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3341
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In a plasma reactor a pumping compartment is separate from a plasma-treating compartment by a structure which includes a central frame. The frame is suspended to the casing of the reactor via spokes. The spokes allow free expansion and contraction of the frame under thermal loading. The slits between the spokes do not allow plasma ignition there and provide for a small flow resistance between the treatment compartment and the pumping compartment. The frame may act as a downholding member for a substrate on the smaller electrode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.