Method for creating a dielectric filled nanostructured silica substrate for flat optical devices
US11473191B2 · kind B2 · utility
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14References
15Claims
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Key dates
| Filing date | Apr 25, 2019 |
| Grant date | Oct 18, 2022 |
| Priority date | — |
| Expiry date | Dec 2, 2039 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for creating a flat optical structure is disclosed, having steps of providing a substrate, etching at least one nanotrench in the substrate, placing a dielectric material in the at least one nanotrench in the substrate and encapsulating a top of the substrate with a film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.