Translating and rotating chuck for processing microelectronic substrates in a process chamber
US11476129B2 · kind B2 · utility
1Cited by
34References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2017 |
| Grant date | Oct 18, 2022 |
| Priority date | — |
| Expiry date | Oct 6, 2039 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68785
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.