Substrate processing apparatus with resistance value varying mechanism
US11488849B2 · kind B2 · utility
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13Claims
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Key dates
| Filing date | Dec 17, 2019 |
| Grant date | Nov 1, 2022 |
| Priority date | — |
| Expiry date | Jan 12, 2040 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68792
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus comprises a holder configured to hold a substrate; a processing liquid supply configured to supply a processing liquid onto the substrate held by the holder; and a resistance value varying mechanism configured to vary an electrical resistance of the holder in contact with the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.