System and method for low-noise edge detection and its use for process monitoring and control
US11508546B2 · kind B2 · utility
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Key dates
| Filing date | Mar 12, 2021 |
| Grant date | Nov 22, 2022 |
| Priority date | — |
| Expiry date | Mar 12, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, calibrating, using unbiased measurement data, the model to a specific lithography process, patterning process, or both to generate a calibrated model, using the calibrated model to predict the low-probability stochastic defect; and modifying, based on the low-probability stochastic defect, a variable, parameter, setting, or some combination of a manufacturing process of a device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.