Chris Mack
36Patents
12h-index
22Co-inventors
81Inventor score
Filing activity: Jul 29, 1993 → Jan 25, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5363171A | Photolithography exposure tool and method for in situ photoresist measurments and exposure control | Physics | 43 | Expired |
| US6968253B2 | Computer-implemented method and carrier medium configured to generate a set of process parameters for a lithography process | Physics | 42 | Expired |
| US7352453B2 | Method for process optimization and control by comparison between 2 or more measured scatterometry signals | Electricity | 37 | Expired |
| US7804994B2 | Overlay metrology and control method | Physics | 37 | Active |
| US7382447B2 | Method for determining lithographic focus and exposure | Physics | 26 | Expired |
| US10176966B1 | Edge detection system | Electricity | 20 | Active |
| US7566517B1 | Feature printability optimization by optical tool | Physics | 17 | Active |
| US7297453B2 | Systems and methods for mitigating variances on a patterned wafer using a prediction model | Emerging Cross-Sectional Technologies | 14 | Expired |
| US7303842B2 | Systems and methods for modifying a reticle's optical properties | Emerging Cross-Sectional Technologies | 14 | Expired |
| US10522322B2 | System and method for generating and analyzing roughness measurements | Electricity | 13 | Active |
| US10664955B2 | Edge detection system and its use for machine learning | Physics | 13 | Active |
| US10488188B2 | System and method for removing noise from roughness measurements | Electricity | 13 | Active |
| US7142941B2 | Computer-implemented method and carrier medium configured to generate a set of process parameters and/or a list of potential causes of deviations for a lithography process | Physics | 12 | Expired |
| US10648801B2 | System and method for generating and analyzing roughness measurements and their use for process monitoring and control | Physics | 12 | Active |
| US10656532B2 | Edge detection system and its use for optical proximity correction | Electricity | 12 | Active |
| US7656512B2 | Method for determining lithographic focus and exposure | Physics | 11 | Active |
| US7075639B2 | Method and mark for metrology of phase errors on phase shift masks | Physics | 10 | Expired |
| US10665418B2 | System and method for generating and analyzing roughness measurements | Electricity | 10 | Active |
| US10665417B2 | System and method for generating and analyzing roughness measurements | Electricity | 10 | Active |
| US10510509B2 | Edge detection system | Electricity | 8 | Active |
| US7528953B2 | Target acquisition and overlay metrology based on two diffracted orders imaging | Physics | 6 | Active |
| US7368208B1 | Measuring phase errors on phase shift masks | Physics | 6 | Active |
| US9188974B1 | Methods for improved monitor and control of lithography processes | Physics | 5 | Active |
| US7300729B2 | Method for monitoring a reticle | Emerging Cross-Sectional Technologies | 4 | Expired |
| US11004653B2 | Edge detection system | Electricity | 4 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.