Silver nanowire protection layer structure and manufacturing method thereof
US11513638B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Dec 18, 2020 |
| Grant date | Nov 29, 2022 |
| Priority date | — |
| Expiry date | Mar 16, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01B1/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A silver nanowire (SNW) protection layer structure includes a substrate; a SNW layer, disposed on the substrate and covering only a partial region of a surface of the substrate, the SNW layer including a plurality of SNW channels; and a SNW protection layer, disposed on the SNW layer and covering a region corresponding to the plurality of SNW channels, the SNW protection layer including a light-resistant antioxidant. A manufacturing method for the SNW protection layer structure above is further provided. The SNW protection layer structure and the manufacturing method thereof are applicable in a touch sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.