Patent · US Active

Imprint method, imprint apparatus, imprint system, and method of manufacturing article

US11520226B2 · kind B2 · utility

0Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 8, 2018
Grant dateDec 6, 2022
Priority date
Expiry dateJul 19, 2039

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/0271
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

The present invention provides an imprint method of performing a forming process which includes supplying an imprint material on a substrate and then forming a pattern of the imprint material on the substrate by using a mold, the method comprising: dispensing, on the substrate, an adhesion material to bring the substrate and the imprint material into tight contact with each other; performing a first annealing process of heating and cooling the substrate on which the adhesion material has been dispensed; conveying the substrate to which the first annealing process has been performed; performing a second annealing process of heating and cooling the substrate which has been conveyed in the conveying; and performing the forming process on the substrate to which the second annealing process has been performed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.