Patent · US Active

Method and apparatus for dynamic lithographic exposure

US11520237B2 · kind B2 · utility

0Cited by

9References

20Claims

0Family size

Assignee

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. · TW

Inventors

Jun-Yih Yu · New Taipei, TW
De-Fang Huang · Hsinchu, TW
De-Chen Tseng · New Taipei, TW
Jia-Feng Chang · Taichung, TW
Li-Fang Hsu · Hsinchu, TW

Key dates

Filing date	May 5, 2021
Grant date	Dec 6, 2022
Priority date	—
Expiry date	Jun 3, 2041

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/22
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present disclosure, in some embodiments, relates to a photolithography tool. The photolithography tool includes a source configured to generate electromagnetic radiation. A dynamic focal system is configured to provide the electromagnetic radiation to a plurality of different vertical positions over a substrate stage. The plurality of different vertical positions include a first position having a first depth of focus and a second position having a second depth of focus that is below the first depth of focus and that vertically overlaps the first depth of focus.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.