System and method for predicting stochastic-aware process window and yield and their use for process monitoring and control
US11521825B2 · kind B2 · utility
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Key dates
| Filing date | Mar 12, 2021 |
| Grant date | Dec 6, 2022 |
| Priority date | — |
| Expiry date | Mar 12, 2041 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a method includes generating a model trained to predict a low-probability stochastic defect, using the model to predict the low-probability stochastic defect, determining a process window based on the low-probability stochastic defect, and controlling, based on the process window, a lithography tool to manufacture a device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.